JPH0219965B2 - - Google Patents
Info
- Publication number
- JPH0219965B2 JPH0219965B2 JP56116215A JP11621581A JPH0219965B2 JP H0219965 B2 JPH0219965 B2 JP H0219965B2 JP 56116215 A JP56116215 A JP 56116215A JP 11621581 A JP11621581 A JP 11621581A JP H0219965 B2 JPH0219965 B2 JP H0219965B2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- electron beam
- exposure
- positive
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Analytical Chemistry (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56116215A JPS5825231A (ja) | 1981-07-24 | 1981-07-24 | 電子線露光によるマスク製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56116215A JPS5825231A (ja) | 1981-07-24 | 1981-07-24 | 電子線露光によるマスク製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5825231A JPS5825231A (ja) | 1983-02-15 |
JPH0219965B2 true JPH0219965B2 (en]) | 1990-05-07 |
Family
ID=14681678
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56116215A Granted JPS5825231A (ja) | 1981-07-24 | 1981-07-24 | 電子線露光によるマスク製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5825231A (en]) |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5267988A (en) * | 1975-12-04 | 1977-06-06 | Matsushita Electric Ind Co Ltd | Throuch-hole formation method |
-
1981
- 1981-07-24 JP JP56116215A patent/JPS5825231A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5825231A (ja) | 1983-02-15 |
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